The TPH 1201 and TPH 2301 turbo pumps, based on the company's TPH 2101 pump, include a new advanced rotor design, improving pumping performance. Designed for harsh duty applications, the TPH 1201 contains a combination of high pumping speed for light gases and high throughput for heavy gases. An advanced rotor geometry permits a high foreline tolerance of 0.5 mbar without the need for a drag state, eliminating clogging in high particulate environments. The TPH 2301 delivers 2100 l/s for nitrogen and 1950 l/s for hydrogen and argon, while offering more than 2000 sccm of gas throughput for argon and nitrogen. It reduces the number of pumps required in semiconductor 300 mm multi-pump chambers, reducing capital costs and footprint while increasing safety, uptime and wafer throughput.
Turbo Pumps
Pfeiffer Vacuum Inc.
The TPH 1201 and TPH 2301 turbo pumps, based on the company's TPH 2101 pump, include a new advanced rotor design, improving pumping performance. Designed for harsh duty applications, the TPH 1201 contains a combination of high pumping speed for light gases and high throughput for heavy gases. An advanced rotor geometry permits a high foreline tolerance of 0.5 mbar without the need for a drag state, eliminating clogging in high particulate environments. The TPH 2301 delivers 2100 l/s for nitrogen and 1950 l/s for hydrogen and argon, while offering more than 2000 sccm of gas throughput for argon and nitrogen. It reduces the number of pumps required in semiconductor 300 mm multi-pump chambers, reducing capital costs and footprint while increasing safety, uptime and wafer throughput.
The TPH 1201 and TPH 2301 turbo pumps, based on the company's TPH 2101 pump, include a new advanced rotor design, improving pumping performance. Designed for harsh duty applications, the TPH 1201 contains a combination of high pumping speed for light gases and high throughput for heavy gases. An advanced rotor geometry permits a high foreline tolerance of 0.5 mbar without the need for a drag state, eliminating clogging in high particulate environments. The TPH 2301 delivers 2100 l/s for nitrogen and 1950 l/s for hydrogen and argon, while offering more than 2000 sccm of gas throughput for argon and nitrogen. It reduces the number of pumps required in semiconductor 300 mm multi-pump chambers, reducing capital costs and footprint while increasing safety, uptime and wafer throughput.
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